bombardment energy

Higher self biasing voltage increases ion bombardment energy and densities of oxygen atoms/ ions, which is a key factor for etching.

基底直流自偏压的提高能增强离子轰击效应和增加氧原子/氧离子密度，因而是决定刻蚀速率的一个关键因素。

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Cr-Cu-N films were deposited using low energy ion beam assisted magnetron sputtering ( IBAMS). The effects of copper and bombardment energy on structure, hardness and fracture toughness of the films were studied.

应用低能离子束辅助磁控溅射（IBAMS）沉积铬-铜-氮薄膜，研究了铜含量和轰击能量对薄膜结构、硬度和断裂韧度的影响。

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Effect of Ion Bombardment Energy on the Properties of Diamond like Carbon Film

离子辅助轰击能量对类金刚石薄膜性能的影响

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When the ion bombardment energy was increased from 400 eV to 800 eV, the film structure was changed remarkably and its fracture toughness and hardness were improved further.

离子辅助轰击能量从400eV增加到800eV时薄膜的结构发生了显著变化，断裂韧度和硬度均大幅度提高。

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Theoretical Approach of Influence of Ion Bombardment on Forming Energy of Diamond Nucleus

离子轰击对金刚石核形成能影响的理论探讨

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The added copper had no obvious effects on the film structure and hardness at same bombardment energy of 400 eV. But added copper was beneficial to improvement of the film fracture toughness.

结果表明：在相同的轰击能量（400eV）下，铜含量对薄膜结构和硬度的影响不明显，但是铜的加入有利于提高薄膜的断裂韧度；

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It is indicated that DLC films prepared via rf-plasma deposition under high ion bombardment energy and low CH_4 pressure have good thermal stability, and the thermal conductivity is 2.1~ 2.4W/ cm · deg.

通过rf等离子体沉积所制得的DLC膜具有好的热稳定性，其热传导率为2.1&2.4W/cm.deg。

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